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11th annual Symposium on Photomask Technology : proceedings : September 25-27, 1991, Sunnyvale, California
Title
11th annual Symposium on Photomask Technology : proceedings : September 25-27, 1991, Sunnyvale, California / sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology.
ISBN
081940733X
9780819407337
Published
Bellingham, Wash. : SPIE--the International Society for Optical Engineering, ©1992.
Physical Description
vii, 348 pages : illustrations ; 28 cm.
Local Notes
Access is available to the Yale community.
Notes
Electronic reproduction. Bellingham, Wash. : SPIE--the International Society for Optical Engineering, 2004. Mode of access: World Wide Web. Access restricted to SPIE Digital Library subscribers.
Access and use
Access restricted by licensing agreement.
Variant and related titles
Eleventh annual Symposium on Photomask Technology
SPIE digital library.
Other formats
Also issued in print.
Original
Format
Books / Online
Language
English
Added to Catalog
November 27, 2017
Series
SPIE proceedings series, 0277-786X ; v. 1604
Bibliography
Includes bibliographical references and index.
Subjects
Also listed under
BACUS (Technical group)
SPIE Digital Library.
Bookmark As
Citation
