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Advances in mirror technology for X-ray, EUV lithography, laser and other applications II : 5 August 2004, Denver, Colorado, USA
Title
Advances in mirror technology for X-ray, EUV lithography, laser and other applications II : 5 August 2004, Denver, Colorado, USA / Ali M. Khounsary, Udo Dinger, Kazuya Ota, chairs/editors ; sponsored ... by SPIE--the International Society for Optical Engineering.
ISBN
0819454710
9780819454713
Published
Bellingham, Wash. : SPIE, ©2004.
Physical Description
1 online resource (ix, 194 pages) : illustrations.
Local Notes
Access is available to the Yale community.
Notes
English.
Access and use
Access restricted by licensing agreement.
Variant and related titles
SPIE digital library. OCLC KB.
Other formats
Print version: Advances in mirror technology for X-ray, EUV lithography, laser and other applications II. Bellingham, Wash. : SPIE, ©2004
Format
Books / Online
Language
English
Added to Catalog
December 04, 2023
Series
SPIE proceedings series, v. 5533
Bibliography
Includes bibliographical references and author index.
Subjects
Genre/Form
Conference papers and proceedings.
Also listed under
Society of Photo-optical Instrumentation Engineers.
SPIE Digital Library.
Bookmark As
Citation
