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1.
Photomask and X-ray mask technology : 22 April 1994, Kawasaki City, Kanagawa, Japan
Published
Bellingham, Wash. : SPIE, ©1994.
Online
Online book
Location
Yale Internet Resource >> None
Format
Books / Online
2.
Metrology, inspection, and process control for microlithography X : 11-13 March, 1996, Santa Clara, California
Published
Bellingham, WA : SPIE, 1996.
Online
Online book
Location
Yale Internet Resource >> None
Format
Books / Online
3.
Advances in microelectronic device technology : 7-9 November 2001, Nanjing, China
Author
International Conference on Advanced Microelectronic/Optoelectronic Device Technology (1st : 2001 : Nanjing, Jiangsu Sheng, China)
Published
Bellingham, Wash., USA : SPIE, ©2001.
Online
Online book
Location
Yale Internet Resource >> None
Format
Books / Online
4.
Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK
Published
Bellingham, Wash. : SPIE, ©2001.
Online
Online book
Location
Yale Internet Resource >> None
Format
Books / Online
5.
Photomask and X-ray mask technology V : 9-10 April, 1998, Kawasaki, Japan
Published
Bellingham, Wash. : SPIE, ©1998.
Online
Online book
Location
Yale Internet Resource >> None
Format
Books / Online
6.
Process, equipment, and materials control in integrated circuit manufacturing V : 22-23 September, 1999, Santa Clara, California
Published
Bellingham, Wash., USA : SPIE, ©1999.
Online
Online book
Location
Yale Internet Resource >> None
Format
Books / Online
7.
Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March, 1996, Santa Clara, California
Published
Bellingham, Wash. : SPIE, ©1996.
Online
Online book
Location
Yale Internet Resource >> None
Format
Books / Online
8.
In-line methods and monitors for process and yield improvement : 22-23 September 1999, Santa Clara, California
Published
Bellingham, Wash., USA : SPIE, ©1999.
Online
Online book
Location
Yale Internet Resource >> None
Format
Books / Online
9.
In-line characterization, yield, reliability, and failure analysis in microelectronic manufacturing II : 31 May-1 June 2001, Edinburgh, UK
Published
Bellingham, Wash. : SPIE, ©2001.
Online
Online book
Location
Yale Internet Resource >> None
Format
Books / Online
10.
Cost and performance in integrated circuit creation : 27-28 February 2003, Santa Clara, California, USA
Published
Bellingham, Wash. : SPIE, ©2003.
Online
Online book
Location
Yale Internet Resource >> None
Format
Books / Online
11.
Design for manufacturability through design-process integration : 28 February-2 March 2007, San Jose, California, USA
Published
Bellingham, Wash. : SPIE, ©2007.
Online
Online book
Location
Yale Internet Resource >> None
Format
Books / Online
12.
Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA
Published
Bellingham, Wash., USA : SPIE, ©2002.
Online
Online book
Location
Yale Internet Resource >> None
Format
Books / Online