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1.
Window and dome technologies and materials XIV : 21-22 April 2015, Baltimore, Maryland, United States
Published
Bellingham, Washington : SPIE, [2015]
©2015
Online
Online book
Location
Yale Internet Resource >> None
Format
Books / Online
2.
Novel optical systems design and optimization XIV : 22 August 2011, San Diego, California, United States
Published
Bellingham, Wash. : SPIE, ©2011.
Online
Online book
Location
Yale Internet Resource >> None
Format
Books / Online
3.
Signal Processing, Sensor/Information Fusion and Target Recognition XXIV : 20-22 April 2015, Baltimore, Maryland, United States
Published
Bellingham, Washington : SPIE, [2015]
©2015
Online
Online book
Location
Yale Internet Resource >> None
Format
Books / Online
4.
Compressive sensing IV : 22-24 April 2015, Baltimore, Maryland, United States
Published
Bellingham, Washington : SPIE, [2015]
©2015
Online
Online book
Location
Yale Internet Resource >> None
Format
Books / Online
5.
Ground/air multisensor interoperability, integration, and networking for persistent ISR VI : 20-22 April 2015, Baltimore, Maryland, United States
Published
Bellingham, Washington : SPIE, [2015]
©2015
Online
Online book
Location
Yale Internet Resource >> None
Format
Books / Online
6.
Automatic target recognition XXV : 20-22 April 2015, Baltimore, Maryland, United States
Published
Bellingham, Washington : SPIE, [2015]
©2015
Online
Online book
Location
Yale Internet Resource >> None
Format
Books / Online
7.
Optical pattern recognition XXVI : 22-23 April 2015, Baltimore, Maryland, United States
Published
Bellingham, Washington : SPIE, [2015]
©2015
Online
Online book
Location
Yale Internet Resource >> None
Format
Books / Online
8.
Next-generation spectroscopic technologies VIII : 20-22 April 2015, Baltimore, Maryland, United States
Published
Bellingham, Washington : SPIE, [2015]
©2015
Online
Online book
Location
Yale Internet Resource >> None
Format
Books / Online
9.
Fiber optic sensors and applications XII : 22-23 April 2015, Baltimore, Maryland, United States
Published
Bellingham, Washington : SPIE, [2015]
©2015
Online
Online book
Location
Yale Internet Resource >> None
Format
Books / Online
10.
Photomask technology 2011 : 19-22 September 2011, Monterey, California, United States
Published
Bellingham, Wash. : SPIE, ©2011.
Online
Online book
Location
Yale Internet Resource >> None
Format
Books / Online
11.
Active photonic materials IV : 22-25 August 2011, San Diego, California, United States
Published
Bellingham, Wash. : SPIE, ©2011.
Online
Online book
Location
Yale Internet Resource >> None
Format
Books / Online
12.
Extreme Ultraviolet (EUV) Lithography VII : 22-25 February 2016, San Jose, California, United States
Published
Bellingham, Washington : SPIE, [2016]
©2016
Online
Online book
Location
Yale Internet Resource >> None
Format
Books / Online
13.
Advanced Etch Technology for Nanopatterning V : 22-23 February 2016, San Jose, California, United States
Published
Bellingham, Washington : SPIE, [2016]
©2016
Online
Online book
Location
Yale Internet Resource >> None
Format
Books / Online
14.
Nanophotonics and macrophotonics for space environments V : 22-23 August 2011, San Diego, California, United States
Published
Bellingham, Wash. : SPIE, ©2011.
Online
Online book
Location
Yale Internet Resource >> None
Format
Books / Online
15.
Optical system alignment, tolerancing, and verification V : 21-22 August 2011, San Diego, California, United States
Published
Bellingham, Wash. : SPIE, ©2011.
Online
Online book
Location
Yale Internet Resource >> None
Format
Books / Online
16.
Metrology, Inspection, and Process Control for Microlithography XXX : 22-25 February 2016, San Jose, California, United States
Published
Bellingham, Washington : SPIE, [2016]
©2016
Online
Online book
Location
Yale Internet Resource >> None
Format
Books / Online
17.
Linear and nonlinear optics of organic materials XI : 21-22 August 2011, San Diego, California, United States
Published
Bellingham, Wash. : SPIE, ©2011.
Online
Online book
Location
Yale Internet Resource >> None
Format
Books / Online
18.
Advances in resist materials and processing technology XXVII : 22-24 February 2010, San Jose, California, United States
Published
Bellingham, Wash. : SPIE, ©2010.
Online
Online book
Location
Yale Internet Resource >> None
Format
Books / Online
19.
Metrology, inspection, and process control for microlithography XXIV : 22-25 February 2010, San Jose, California, United States
Published
Bellingham, Wash. : SPIE, ©2010.
Online
Online book
Location
Yale Internet Resource >> None
Format
Books / Online
20.
Advances in X-ray/EUV optics and components VI : 22-24 August 2011, San Diego, California, United States
Published
Bellingham, Wash. : SPIE, ©2011.
Online
Online book
Location
Yale Internet Resource >> None
Format
Books / Online
21.
Reliability of photovoltaic cells, modules, components, and systems IV : 22-25 August 2011, San Diego, California, United States
Published
Bellingham, Wash. : SPIE, ©2011.
Online
Online book
Location
Yale Internet Resource >> None
Format
Books / Online
22.
Extreme ultraviolet (EUV) lithography : 22-25 February 2010, San Jose, California, United States
Published
Bellingham, Wash. : SPIE, 2010.
Online
Online book
Location
Yale Internet Resource >> None
Format
Books / Online
23.
High and low concentrator systems for solar electric applications VI : 22-24 August 2011, San Diego, California, United States
Published
Bellingham, Wash. : SPIE, ©2011.
Online
Online book
Location
Yale Internet Resource >> None
Format
Books / Online
24.
Imaging spectrometry XVI : 22-23 August 2011, San Diego, California, United States
Published
Bellingham, Wash. : SPIE, ©2011.
Online
Online book
Location
Yale Internet Resource >> None
Format
Books / Online
25.
Hard x-ray, gamma-ray, and neutron detector physics XIII : 22-24 August 2011, San Diego, California, United States
Published
Bellingham, Wash. : SPIE, ©2011.
Online
Online book
Location
Yale Internet Resource >> None
Format
Books / Online